DUBLIN--(BUSINESS WIRE)--Research and Markets (http://www.researchandmarkets.com/research/5kjbxp/semiconductor) has announced the addition of the "Semiconductor Strain Metrology: Principles and Applications" book to their offering.
This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this e-book specifically discusses strain metrology with both depth and focus.
Key Topics Covered:
PART 1: INTRODUCTION
1 Introduction to Strain Metrology for Semiconductors
2 Strain, Stress and Semiconductor Properties
PART 2: OPTICAL STRAIN METROLOGY
3 Variable Angle Spectroscopic Ellipsometry
4 Photoreflectance Method
5 Micro-Raman Spectroscopy
PART 3: ELECTRON BEAM STRAIN METROLOGY
6 Cathodoluminescence Method
7 Nano-Beam Diffraction and Convergent Beam Electron Diffraction
8 Dark-Field Electron Holographic Moire Method
PART 4: EMERGING STRAIN METROLOGY
9 Tip-Enhanced Raman Spectroscopy
10 Atomic Force Microscopy Digital Image Correlation Method
11 Synchrotron X-Ray Micro/Nanodiffraction Methods
12 Conclusion and Outlook
For more information visit http://www.researchandmarkets.com/research/5kjbxp/semiconductor